MBE system OCTOPLUS 500

• State-of-the-art e-beam evaporation system
• Ideal for Si, SiGe and carbon alloys epitactical growth or metal deposition
• Accommodates horizontal substrates up to 6''
• Two e-beam gun ports
• Six effusion cell or gas source ports
• In-situ characterization capability
• Ease of use and maintenance
• Clean room assembled and tested
• Strong support by PhD MBE experts

Among the wide range of materials covered by products of Dr. Eberl MBE-Komponenten GmbH we have probably most knowledge in the group IV element C, Si and Ge MBE. Based on many years of active research experience in the field of growth and doping applications with these elements our team develops and manufactures the OCTOPLUS 500 system and all essential components. Each product is assembled and carefully tested in-house.

The OCTOPLUS 500 system has been developed for the growth of high quality Si/SiGe heterostructures on 4 inch Si substrates. Optionally the system can be upgraded to 6 inch substrate size. The MBE chamber is equipped with two electron beam evaporating guns and up to 6 effusion cells or gas injectors for deposition or surface treatment.

• application (e.g. Si/SiGe heterostructures etc.)
• sample size or wafer size (4'' or 6'')
• additional load-lock or buffer chambers
• wafer transfer system
• effusion cells, gas sources, manipulator
• pumping system (turbo molecular pumps, cryopumps etc.)
• in-situ characterization tools
• software/hardware control system
• additional requirements

The beam flux produced by the electron guns can be monitored by cross-beam quadrupole mass spectrometers on the elements employed. The substrate manipulator applies pyrolytic graphite or alternatively tungsten or tantalum heaters. The OCTOPLUS 500 MBE system is field-proven and ideally suited for Si/SiGe heterostructure growth or metal deposition for applications in research and production processes.

Outstanding features of the OCTOPLUS 500 are the high reliability and versatility of the system and its small footprint.

The standard version of the OCTOPLUS 500 comprises 8 source ports, from which we recommend 6 to be used for effusion cells, sublimation sources or comparable components. 2 large ports are provided for e-beam evaporating guns. A rapidly pump-down load lock chamber with a horizontal working transfer rod system allows easy substrate introduction without breaking the vacuum of the MBE chamber.


We are happy to discuss your MBE system specifications and give competent advice for your application.
The OCTOPLUS 500 is in use in leading laboratories. On demand we transmit a detailed list of references. Please contact our sales department for further questions and specification information.

 LAST UPDATE: APRIL, 2005

© 2003 Dr. Eberl MBE-Komponenten GmbH