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Keyword: atomic layer deposition system
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atomic layer deposition system in Systems - Dr. Eberl MBE-Komponenten GmbH
The product range includes various kinds of customized MBE systems for SiGe, III-V, II-VI and oxide layer deposition.
The product range includes various kinds of customized MBE systems for SiGe, III-V, II-VI and oxide layer deposition.
atomic layer deposition system in OCTOPLUS 400 - Dr. Eberl MBE-Komponenten GmbH
OCTOPLUS 400 systems are ideally suited for III-V, II-VI and other compound semiconductor applications. The OCTOPLUS 400 can be adapted to small wafer segments.
OCTOPLUS 400 systems are ideally suited for III-V, II-VI and other compound semiconductor applications. The OCTOPLUS 400 can be adapted to small wafer segments.
atomic layer deposition system in OCTOPLUS 500 - Dr. Eberl MBE-Komponenten GmbH
The OCTOPLUS 500 system was developed for the growth of high quality III-V and II/VI heterostructures on 4 inch or 6 inch Si substrates.
The OCTOPLUS 500 system was developed for the growth of high quality III-V and II/VI heterostructures on 4 inch or 6 inch Si substrates.
atomic layer deposition system in Home - Dr. Eberl MBE-Komponenten GmbH
Dr. Eberl MBE-Komponenten GmbH develops, manufactures and sells thin film deposition equipment for MBE, surface science and other UHV-applications.
Dr. Eberl MBE-Komponenten GmbH develops, manufactures and sells thin film deposition equipment for MBE, surface science and other UHV-applications.
atomic layer deposition system in OCTOPLUS 300 - Dr. Eberl MBE-Komponenten GmbH
The OCTOPLUS 300 system is ideally suited for material deposition onto small samples. It ensures a good accessability and easy operation and maintenance.
The OCTOPLUS 300 system is ideally suited for material deposition onto small samples. It ensures a good accessability and easy operation and maintenance.
atomic layer deposition system in OCTOPLUS-O 400 - Dr. Eberl MBE-Komponenten GmbH
The OCTOPLUS-O 400 MBE system features a unique dual zone design with differential pumping that allows depositing oxide layers under high partial pressure.
The OCTOPLUS-O 400 MBE system features a unique dual zone design with differential pumping that allows depositing oxide layers under high partial pressure.
atomic layer deposition system in OCTOPLUS 500 EBV - Dr. Eberl MBE-Komponenten GmbH
The OCTOPLUS 500 EBV system has been developed for the growth of high quality Si/SiGe heterostructures on 4 inch or 6 inch Si substrates.
The OCTOPLUS 500 EBV system has been developed for the growth of high quality Si/SiGe heterostructures on 4 inch or 6 inch Si substrates.
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