OCTOPLUS 300

MBE system for small samples (10x10 mm²) with up to 9 ports for effusion cells

Octoplus 300

 Datasheet


Mini III/V, II/VI, topological insulator or other material MBE system

  • Compact and versatile research MBE system with small footprint
  • Applications: II-VI, III-V, IV-IV, metals, magnetic materials, topological insulators, nanowire growth, oxides, organic materials
  • 9 source ports DN40CF (O.D. 2.75’’) or 8 source ports (2x DN63CF (O.D. 4.5’’), 6x DN40CF (O.D. 2.75’’))
  • Wide range of source options
  • Sample size : flag style 10x10 mm2 , 1’’ or 2’’ wafer
  • Effective UHV pumping system
  • Stainless steel LN2 cooling shroud
  • Low energy and LN2 consumption
  • In-situ monitoring capability
  • Professional support by PhD MBE experts

General Information

Small flag style sample plate
Small flag style sample plate

The OCTOPLUS 300 system is ideally suited for material deposition on small samples. It provides good access and easy operation and maintenance. The chamber design of the OCTOPLUS 300 plus various state-of-the-art components allow layer by layer precise MBE growth.

Outstanding features of the OCTOPLUS 300 are the high reliability and versatility of the system and its small footprint. These features make the OCTOPLUS 300 system particularly suited for applications in research and development. Nonetheless specific production processes are also covered.

The standard version of the OCTOPLUS 300 comprises 8 source ports, two ports with 4.5 inch (DN63CF) and six ports with 2.75 inch (DN40CF) flange size. By using Source Clusters up to 10 sources can be integrated into the system. A rapid pump-down load lock chamber with a horizontally working transfer-rod system allows the user an easy substrate introduction without breaking the vacuum of the MBE chamber.

We provide different kinds of effusion cells, valved cracker sources, gas sources and substrate manipulators according to all our customers’ requirements. A well-manageable in-situ characterization is obtained by using beam-flux-gauges, pyrometers, RHEED systems or quadrupole mass analyzers (QMA).

We are happy to discuss your MBE system specifications and give competent advice for your application. Do not hesitate to contact us.

Options for OCTOPLUS 300

  • Additional load lock or buffer chambers

  • Wafer transfer system

  • 2 cm³, 10 cm³, 35 cm³, 60 cm³ effusion cells, source clusters, electron beam evaporators, cracker and valved cracker sources, manipulators, power supplies and control units

  • Pumping system (ion getter pumps, turbopumps, cryopumps etc.)

  • Control system

  • In-situ characterization tools, e.g. ion gauge, Quartz Crystal Microbalance (QCM), pyrometer, RHEED, QMA

Technical Data

Size of deposition chamber
300 mm I.D.
Base pressure
< 5x10-11 mbar
Pumpingturbopump, ion getter pump and TSP
Cooling shroudLN2 or water cooling
Substrate heater temperatureup to 1200°C
Substate sizesmall sample plates or up to 2" wafers
Bakeout temperatureup to 200°C
Source ports9 ports DN40CF or 8 ports (2xDN63CF, 6xDN40CF)
Source types
effusion cells, e-beam evaporators, sublimation sources, valved cracker sources, gas sources
Shutters
soft-acting rotary shutters
In-situ monitoringion gauge, QCM, pyrometer, RHEED, QMA
Sample transferlinear transfer rod (manual)
Load lockmagazine with 6 substrates turbo-pumped
MBE control softwareTiny Tusker
Servicesystem installation and acceptance testing
MBE trainingby MBE experts

Examples for applications and corresponding sources

Effusion Cells
WEZ , NTEZ
OME , HTEZ
Sublimation Sources
SUKO , SUSI
HTS , DECO
Valved Sources
VACS , VGCS
VCS , VSCS
Plasma Sources
FMP
E-Beam
Evaporators
EBVV
III/VGa, In, AlC, Si dopingAs, P, Sb
II/VIZn, Cd, BeS, Se, TeN-doping
IVGe, Sn, PbB, P, Sb dopingSi, Ge
GaNGa, In, AlN
MetalsCu, Al, Ni, Co, ...Pt, Ta, Pd, Mo, W
Topological InsulatorsGe, Sn, Te, Bi, GeSbSe, TeB
Graphene / SiliceneC, Si
OxidesFe, Ni, Mn, Bi, Eu,
Ga, ...
O
Thin Film Solar CellsCu, Ga, In, Zn, NaF,
Fe, Sn
S, Se

The product range and quality of Dr. Eberl MBE-Komponenten GmbH benefit from many years of active research experience of its team members.

We now look back on about 30 years of development and manufacture of complex systems and components for multiple tasks in the applied research and production of compound semiconductor materials. Each product is assembled and carefully tested in-house by our MBE experts.