OCTOPLUS 800

MBE system for multi-wafer capability

Octoplus 800

State-of-the-art MBE system for semiconductor device production

  • Applications: III/V, II/VI or other material heterostructures
  • Substrate sizes 200mm, 150mm or 4 x 3-inch or 7 x 2-inch wafers, with face-down geometry
  • Optional 800+ version with multi-wafer 4 x 4-inch and 7 x 3-inch capability
  • Smaller footprint, smarter design: optimized deposition geometry enables up to 50% more material output than conventional 4×4" wafer systems.
  • Wide range of source options, e.g. effusion cells, valved cracker sources, etc.
  • LN2 cooling shroud and high-performance UHV pumping system
  • In-situ characterization capability, customizable to your needs
  • 12 large source ports
  • Fully automated wafer transfer
  • Extensive in-situ characterization capability
  • Professional support by PhD MBE experts

General Information

Octoplus 800
UFO chamber with fully automated wafer transfer by central handling arm.

Octoplus insight
Substrate handler detail view

Octoplus insight2
Substrate handler

The OCTOPLUS 800 allows the MBE growth on multi wafer and single 150mm or 200mm substrates. It exhibits 12 large source ports for high capacity effusion cells, valved crackers and other sources. Depending on the application, the substrate manipulator applies to Graphite, SiC, free standing tungsten or tantalum heaters with PBN diffusor plate.

The OCTOPLUS 800 MBE system offers highly reproducible sample quality, it is field-proven and ideally suited for III/V, II/VI and other compound semiconductor layer growth for applications in production of semiconductor devices.

The OCTOPLUS 800 is in use in leading research institutes and industrial laboratories. On demand we provide a list of references. Please contact our sales department for further information.

The OCTOPLUS 800+ sets the standard for efficient, reproducible MBE growth of III‑V compounds and advanced heterostructures in a multi‑wafer configuration. With capacity for up to 12 sources on DN125CF flanges, the system offers exceptional flexibility for complex material designs.

Tailored substrate manipulators with a wide range of heater options ensure precise temperature control, perfectly adapted to your process needs. Proven in real‑world applications, the OCTOPLUS 800 combines reliability, scalability, and performance - making it the ideal choice for pioneering research and high‑value production.

High reliability and versatility are outstanding features of the OCTOPLUS 800 system. With the standard version already comprising 12 radially arranged source ports, the OCTOPLUS 800 can be further expanded and customized with additional source ports on request.

A rapid pump-down load lock chamber with wafer magazine, a heated station and the fully automated central transfer allows easy substrate introduction and handling.

Options for OCTOPLUS 800

  • Additional load-lock, heated station, or buffer chambers
  • Wide range of components, e.g., effusion cells, e-beam-evaporators, sublimation sources, valved cracker sources, gas sources, manipulators
  • Software/hardware control system
  • Pumping system (cryopump, turbo, ion, white phosphorous recovery)
  • In-situ monitoring tools, e.g. RHEED, BFM, quartz microbalance, pyrometer, band-edge thermometry, ellipsometry

Technical Data

Size of deposition chamber
800 mm I.D.
Base pressure
< 5x10-11 mbar
PumpingTSP, ion getter pump, cryopump and/or turbopump
Cooling ShroudLN2 or other cooling liquid on request
Substrate heater temperatureup to 800°C, or up to 1200°C
Substate size200mm, 150mm or 4 x 3-inch or 7 x 2-inch wafers
Option 800+: 4 x 4-inch or 7 x 3-inch wafers
Bakeout temperatureup to 200°C
Source ports12 ports DN125CF / DN150CF
Source types
effusion cells, e-beam evaporators, sublimation sources, valved cracker sources, gas sources
Shutters
soft-acting linear shutters
In-situ monitoringion gauge, QCM, pyrometer, RHEED, QMA, temperature control by kSA or Laytec, wafer curvature etc.
Sample transferfully automatic in face-down geometry
Load lockmagazine with 10 substrates, with rapid pump down
MBE control softwareTiny Tusker
Servicesystem installation and acceptance testing
MBE trainingby MBE experts with extensive application know-how

Trusted expertise since 1990

Based on many years of active research experience in the field of growth and doping applications our team develops and manufactures the OCTOPLUS 600 system and all essential components. Each product is assembled and carefully tested in-house.

We are happy to discuss your MBE system specifications and give competent advice for your application.
The OCTOPLUS 600 is in use in leading laboratories. On demand we transmit a detailed list of references. Please contact our sales department for further questions and specification information.