The OCTOPLUS-O 350 MBE system features flexible differential pumping that allows depositing oxide layers under high partial pressure from a wide range of sources.
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Oxide MBE system with efficient differential pumping
Applications for many oxide and metal materials
8 MBE source ports DN63CF (O.D. 4.5"), extended version with up to 12 ports
Wide range of source options; compatible to multi-pocket e-beam evaporation
Small samples or wafer sizes up to 2"
Strong differential pumping
Ozone-resistant SiC substrate heater or CO2 laser substrate heating
Ozone injection close to substrate
In-situ characterization capability
Professional support by PhD MBE experts
General Information
The OCTOPLUS-O 350 is very thoroughly designed for oxide layer
deposition. The unique design with effective differential pumping allows
depositing oxide layers in high Oxygen or Ozone partial pressure without
strong degeneration of the hot sources. The OCTOPLUS-O 350 system can be
easily adapted to small wafer segments as well as to 2 inch wafers. The
field-proven vertical chamber design of the OCTOPLUS-O 350 plus various
state-of-the-art components allow layer by layer precise MBE growth.
Outstanding features of the OCTOPLUS-O 350 are the special design, high
reliability and versatility of the system and its compactness. These
features make our systems particularly suited for applications in
research and development. Nonetheless specific production processes are
also covered.
The standard version of the OCTOPLUS-O 350 comprises 8 source ports 4.5
inch (DN63CF) flange size. A rapid pump-down load lock chamber with a
horizontal working transfer rod system allows easy substrate
introduction without breaking the vacuum of the MBE chamber.
Options for OCTOPLUS-O 350
Additional load-lock and buffer chambers
Wafer transfer system
Sources: effusion cells, (multi-pocket) e-beam evaporators, etc.
Retractable sources for reloading without chamber venting and possibility of differentially pumping the sources
Multiple turbomolecular pumps for differential pumping
Ozone source with or without enrichment
Oxygen plasma source
Software / hardware control system
In-situ characterization tools, e.g. ion gauge, Quartz Crystal Microbalance (QCM), pyrometer, RHEED, QMA
Compact Ozone Source without enrichment up to 15% Ozone
We provide different kinds of effusion cells, valved cracker sources,
gas sources and substrate manipulators according to customers'
requirements.
CO2 laser heating allows substrate heating up to more than
1400°C. A backside metal coating of the substrate is not needed, since the CO2 laser light is strongly absorbed by various oxide
substrates. Please see corresponding
paper .
A well-manageable in-situ characterization is obtained by using Quartz Crystal Microbalance (QCM), RHEED systems or quadrupole mass analyzers (QMA).
\(Al_2O_3\)
substrate heated by
\(CO_2\)
laser. (Courtesy of Prof. J. Mannhart, MPI-FKF Stuttgart)
We are happy to discuss your MBE system specifications and give
competent advice for your application. Do not hesitate to
contact us.
The OCTOPLUS-O 350 is in use in leading laboratories. On demand we
transmit a detailed list of references.
Product range and quality of Dr. Eberl MBE-Komponenten GmbH benefit from
the many years of active research experience of its team members. We now
look back on about 30 years of development and manufacture of complex
systems and components for multiple tasks in the applied research and
production of compound semiconductor materials. Each product is
assembled and carefully tested in-house by our MBE experts.