OCTOPLUS-O 600

The OCTOPLUS-O 600 MBE system features flexible differential pumping options that allows depositing oxide layers under high partial pressure from a wide range of sources.

Octoplus-O 600
MBE system OCTOPLUS-O 600

  • Oxide MBE System with efficient differential pumping

  • Applications for many oxide and metal materials

  • 12 MBE source ports DN63CF/DN100CF

  • Wide range of source options; compatible to multi-pocket e-beam evaporation

  • wafer size up to 4"

  • Strong differential pumping

  • Ozone-resistant SiC substrate heater
    or CO2 laser substrate heating

  • Ozone injection close to substrate

  • In-situ characterization capability

  • Professional support by PhD MBE experts

The OCTOPLUS-O 600 is very thoroughly designed for oxide layer deposition. The unique design with effective differential pumping allows depositing oxide layers in high Oxygen or Ozone partial pressure without strong degeneration of the hot sources. The OCTOPLUS-O 600 system can be easily adapted to small wafer segments as well as to 4inch wafers. The field-proven vertical chamber design of the OCTOPLUS-O 600 plus various state-of-the-art components allow layer by layer precise MBE growth.

Outstanding features of the OCTOPLUS-O 600 are the special design, high reliability and versatility of the system and its compactness. This makes it applicable for both wafer scale research and development and pilot production environment.

The standard version of the OCTOPLUS-O 600 comprises 12 source ports. A rapid pump-down load lock chamber with a horizontal working transfer rod system allows easy substrate introduction without breaking the vacuum of the MBE chamber. Integration to a wafer transfer robot for fully automated substrate transfer is also available.

Options for OCTOPLUS-O 600:

  • Additional load-lock and buffer chambers

  • Wafer transfer system

  • Sources: effusion cells, (multi-pocket) e-beam evaporators, etc.

  • Retractable sources for reloading without chamber venting and possibility of differentially pumping the sources

  • Multiple turbomolecular pumps for differential pumping

  • Ozone source with or without enrichment

  • Oxygen plasma source

  • Software / hardware control system

  • In-situ characterization tools, e.g. ion gauge, quartz, pyrometer, RHEED, QMA

Ozone Source
Compact Ozone Source without enrichment up to 15% Ozone

We provide different kinds of effusion cells, valved cracker sources, gas sources and substrate manipulators according to customers’ requirements.

CO2 laser heating allows substrate heating up to more than 1400°C.
A backside metal coating of the substrate is not needed, since the CO2 laser light is strongly absorbed by various oxide substrates.
Please see corresponding paper .

A well-manageable in-situ characterization is obtained by using quartz micro-balance, RHEED systems or quadrupole mass analyzers (QMA).

CO2 substrate heating
\(Al_2O_3\) substrate heated by \(CO_2\) laser. (Courtesy of Prof. J. Mannhart, MPI-FKF Stuttgart)

We are happy to discuss your MBE system specifications and give competent advice for your application. Do not hesitate to contact us.

The OCTOPLUS-O 600 is in use in leading laboratories. On demand we transmit a detailed list of references.

Technical data

Base pressure
< 5x10-11 mbar (depends on pumping system)
Pumpingcryopump, turbopump, TSP or ion getter pump
Cooling ShroudLN2 or other cooling liquid on request
Substrate heater temperatureup to 800°C, 1000°C or 1400°C
Substate sizeup to 4" diameter
Bakeout temperatureup to 200°C
Source ports12 source ports DN63CF/DN100CF. Port configuration is adapted to your source options.
Source types
effusion cells, e-beam evaporators, sublimation sources, valved cracker sources, gas sources
Shutters
soft-acting linear or rotary shutters
In-situ monitoringion gauge, QCM, pyrometer, RHEED, QMA
Sample transferlinear transfer rod, manual or semi-automatic
Load lockturbo-pumped, magazine with 6 substrates
MBE control softwareTiny Tusker
Servicesystem installation and acceptance testing
MBE trainingby MBE experts

Examples for applications and corresponding sources

Effusion Cells
WEZ , NTEZ
HTEZ
Sublimation Sources
SUKO , SUSI
HTS , DECO
Ozone Sources
O3S
Plasma Sources

E-Beam
Evaporators
EBVV , EBVM
OxidesFe, Ni, Mn, Bi, Eu, Ga, ...COzoneOIr, La, Ni, Ru, Mo, Ta, W, Nb, ...

Product range and quality of Dr. Eberl MBE-Komponenten GmbH benefit from the many years of active research experience of its team members. We now look back on about 30 years of development and manufacture of complex systems and components for multiple tasks in the applied research and production of compound semiconductor materials. Each product is assembled and carefully tested in-house by our MBE experts.