The new Free Microplasma Source FMP provides a pure localized plasma for substrate cleaning applications, surface preparation or layer growth within an UHV chamber or MBE system at low chamber pressure. This setup provides high purity plasma creation with effectively reduced wall interaction as well as a drastically reduced RF power consumption due to the small plasma size.
The Free Microplasma Source FMP can be mounted into common MBE growth chambers.
For further information, please visit FMP.

The new Valved Thermal Cracker Cell VTCC is a full PBN valved cell with a water cooled cracker stage. The compact design of the cell allows its implementation on the space-saving DN40CF (O.D. 2.75") flange. It features a crucible size of 130 cm3 which is sufficient for most R&D applications. This, in combination with the full PBN construction of the valve, reservoir and cracker, enables a wide variety of the VTCC applications with the numerous high vapor pressure evaporation materials.

For further information, please visit VTCC.

Dr. Eberl MBE-Komponenten GmbH is proud to announce, that we are now an approved training company “Ausbildungsbetrieb” registered by the IHK Stuttgart.

From 2020 on we will take suitable apprentices in the field of electronics - automation and mechatronics.

Our versatile Oxide MBE system OCTOPLUS-O 400 is ideally suited for epitaxial oxide layer deposition. It is available with an ozone-resistant SiC substrate heater or alternatively with CO2 laser substrate heating.
Substrate heating in oxygen environment by means of a CO2 laser turns out to be very effective. Various oxide substrates absorb CO2 laser light strongly and allow subtrate heating up to more than 1400°C. An additional backside metal coating is not necessary.
Please see reference.