We would like to invite you to visit our product presentation at the 34th North American Conference on Molecular Beam Epitaxy (NAMBE 2018) in Banff, Alberta, Canada. The NAMBE 2018 Exhibit will be open from October 1-3, 2018. You will find us at booth no. 14.
Dr. Eberl MBE-Komponenten GmbH is participating in the 1st Joint ISTDM / ICSI 2018 Conference in Potsdam, Germany, which is beeing held from May 27 - 31, 2018. We are looking forward to meeting you at our stand.
Dr. Eberl MBE-Komponenten GmbH will be represented by its subsidiary BE Instrument Trading Co. Ltd. at the 12th National Conference on MBE in Taiyuan City, Shan'xi Province, China. We are looking forward to meeting you there.
From May 14-19, 2017 we will be attending the exhibition at the International Conference on Silicon Epitaxy and Heterostructures ICSI-10 at the University of Warwick, Coventry, UK. We are looking forward to meeting you at our booth.
Dr. Eberl MBE-Komponenten is pleased to announce that we will be exhibiting at the 19th European Molecular Beam Epitaxy Workshop in Korobitsyno, St. Petersburg, Russia on March 19-22, 2017. We are looking forward to meeting you at our booth.
The new Atomic Carbon Sublimation Source SUKO-A provides highly reactive atomic carbon instead of the large percentage of C2 and C3 clusters that naturally arise during the sublimation of graphite. The SUKO-A source provides significant advantages, e.g., for the MBE growth of graphene or space simulation. Existing SUKO sources can easily be upgraded. The SUKO-A can be mounted into common UHV analysis systems or MBE growth chambers. Cooling shroud and shutter are optionally available. For further information, please visit SUKO-A.
Dr. Eberl MBE-Komponenten GmbH is proud to be partner of the ACCESS-CIGS project within the SOLAR-ERA.NET Initiative (http://www.solar-era.net/). As part of a bi-national European consortium, Dr. Eberl MBE-Komponenten GmbH will develop a sophisticated evaporation tool for a plasma enhanced selenization process. The project is focused on reducing the cost of producing CIGS thin film solar cells by optimizing the Se supply and selenization process. Project partners are TNO/Solliance and Smit Thermal Solutions, both located in Eindhoven, Netherlands, and the PVcomB, which is part of the Helmholtz-Zentrum Berlin (HZB).
Versatile MBE system which is ideally suited for epitaxial oxide layer deposition combined with various in-situ analysis options.
The Oxide MBE-System Octoplus-O 400 is a thoroughly designed MBE system. Its unique dual zone concept allows depositing epitaxial oxide layers in high Oxygen or Ozone partial pressure without intense degeneration of the hot sources.
Valved Sulfur Source VSS for R&D applications where valve controlled flux rates of Sulfur or Selenium are required. The new Valved Sulfur Source VSS is a compact and economical alternative to our larger Valved Sulfur Cracking Source VSCS if a small or medium size reservoir is sufficient.
Dr. Karl Eberl founded “Dr. Eberl MBE-Komponenten GmbH” on November 30, 1990 as a spin-off from the Technische Universität München, Walter-Schottky-Institute. First products were Silicon Sublimation Sources, Carbon Sublimation Sources and High Temperature Sources for Molecular Beam Epitaxy.
Thermal Cracker Cell TCC for evaporation of high vapor pressure materials like Se, Sb, Te or Mg The new Thermal Cracker Cell TCC is designed for evaporation of high vapor pressure materials like Se, Sb, Te or Mg at operation temperatures from 100 to 650 °C with an additional cracker stage for up to 1400°C on the end of the injector pipe. It is an efficient valve-free alternative to space-consuming large reservoir Valved Cracker Sources. For more information please see TCC.
Our VSCS provides optical access to the injector tube and a new sensor concept is used to measure the flux. Our customer published a poster, which is presented on the 6th World Conference on Photovoltaic Energie Conversion WCPEC-6.