New MBE-System OCTOPLUS-O 200
The OCTOPLUS O-200 MBE system features flexible differential pumping for depositing oxide layers under high partial pressure from a wide range of sources.
Key Features & Advantages:
- Optimized Geometry: 8 MBE source ports in an ultra-compact layout ensure a short source-to-substrate distance for superior deposition efficiency.
- Flexible Source Options: Compatible with a wide range of sources, including multi-pocket e-beam evaporation.
- Advanced Pumping System: Features individual cell pumping with isolation valves, keeping cells safely separated from the growth chamber when not in use.
- Enhanced Differential Pumping: An optional water-cooled aperture between the source and substrate boosts pumping efficiency through evaporant-induced gettering.
- Versatile Substrate Heating: Choose between an ozone-resistant SiC heater or a CO2 laser substrate heating system.
- Ozone Injection: Delivers ozone precisely close to the substrate for high partial-pressure growth.
- Flexible Substrate Sizing: Accommodates small samples or wafers up to 2".
- Built-in Characterization: Equipped for seamless in-situ analysis.
- Expert Support: Backed by professional guidance from PhD-level MBE specialists.
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Technical specifications are subject to change without notice.