Discover our new PVD 350 and PVD 550 PVD systems. They are ideally suited for material deposition on large samples and provide good access as well as easy operation and maintenance. The chamber design of the various state-of-the-art components allow precise growth. The PVD 350 system is designed for up to 100 mm wafers. The PVD 550 is avaliable in configurations up to 300 mm.