Oxide MBE system with efficient differential pumping
- Applications for many oxide and metal materials
- 8 MBE source ports
- Wide range of source options; compatible to multi-pocket e-beam evaporation
- Small samples or wafer sizes up to 2"
- Flexible differential pumping arrangements.
- Individual pumping for each cell possible; cells can be seperated from growth chamber when not in use
- Optional water cooled aperture between source and substrate for enhanced differential pumping through evaporant induced gettering.
- Ozone-resistant SiC substrate heater or CO2 laser substrate heating
- Ozone injection close to substrate
- In-situ characterization capability
- Professional support by PhD MBE experts
General Information
The OCTOPLUS O-200 is very thoroughly designed for oxide layer deposition. The unique design with effective differential pumping allows depositing oxide layers in high Oxygen or Ozone partial pressure without strong degeneration of the hot sources. The OCTOPLUS O-200 system can be easily adapted to small wafer segments as well as to 2 inch wafers. The field-proven vertical chamber design of the OCTOPLUS O-200 plus various state-of-the-art components allow layer by layer precise MBE growth.
Outstanding features of the OCTOPLUS O-200 are the special design, high reliability and versatility of the system and its compactness. These features make our systems particularly suited for applications in research and development. Nonetheless specific production processes are also covered.
The standard version of the OCTOPLUS O-200 comprises 8 source ports. A rapid pump-down load lock chamber with a horizontal working transfer rod system allows easy substrate introduction without breaking the vacuum of the MBE chamber.
Options for OCTOPLUS O-200
- Additional load-lock and buffer chambers
- Wafer transfer system
- Sources: effusion cells, (multi-pocket) e-beam evaporators, etc.
- Retractable sources for reloading without chamber venting and possibility of differentially pumping the sources
- Multiple turbomolecular pumps for differential pumping
- Ozone source with or without enrichment
- Oxygen plasma source
- Software / hardware control system
- In-situ characterization tools, e.g. ion gauge, Quartz Crystal Microbalance (QCM), pyrometer, RHEED, QMA
We provide different kinds of effusion cells, valved cracker sources, gas sources and substrate manipulators according to customers’ requirements.
CO2 laser heating allows substrate heating up to more than
1400°C.
A backside metal coating of the substrate is not needed, since the CO2 laser light is strongly absorbed by various oxide
substrates.
Please see corresponding
paper .
A well-manageable in-situ characterization is obtained by using Quartz Crystal Microbalance (QCM), RHEED systems or quadrupole mass analyzers (QMA).
We are happy to discuss your MBE system specifications and give competent advice for your application. Do not hesitate to contact us.
The OCTOPLUS O-200 is in use in leading laboratories. On demand we transmit a detailed list of references.
Technical Characteristics
| Base pressure | < 5x10-10 mbar (depends on pumping system) |
| Pumping | turbopump, custom pumping configurations possible |
| Cooling Shroud | water cooling |
| Substrate heater temperature | up to 1200°C |
| Substate size | scientific sample plates (10x10 mm2) |
| Source ports | 8 source ports DN40CF multi-pocket e-Beam evaporator option |
| Source types | effusion cells, e-beam evaporators, sublimation sources, valved cracker sources, gas sources |
| Shutters | soft-acting rotary shutters |
| In-situ monitoring | ion gauge, QCM, pyrometer, RHEED, QMA |
| Sample transfer | linear transfer rod (manual) |
| Load lock | magazine with 10 flag-shaped scientific substrates turbo-pumped |
| Control software | Tiny Tusker |
| Service | system installation and acceptance testing |
| MBE training | by MBE experts with extensive application know-how |
Examples for applications and corresponding sources
| Material System | Effusion Cells | Sublimation Sources | Valved / Cracker Sources | Plasma Sources | E-Beam evaporators |
|---|---|---|---|---|---|
| Products | WEZ NTEZ HTEZ | SUKO SUSI HTS DECO | Metal-organic source | FMP RFP | EBVV EBVM EBV |
| Perovskite Oxides | Sr, Ba, Ca, Al | C | TTIP | O-plasma | Ti, La |
| High-Tc Cuprates | Ba,Cu,Sr,Y,Pr ... | Ozone, O-plasma | La,Y,Pr, ... | ||
| Ferroelectric Oxides (STO/BTO) | Pb, Fe, Bi, Ba, ... | TTIP | Ozone, O-plasma | Ti ... | |
| Magnetic Oxides | Sr, Gd, Cr, La, Fe ... | TTIP | Ozone, O-plasma | La, Ti ... | |
| Ultra-wide band gap oxide | Ga, Al, Zn, In, Sn, Ge | Si | Ozone, O-plasma, O+N-plasma | La ... | |
| Transition Metal Oxides | Fe, Ni, Mn, Bi, Eu, ... | C | Ozone, O-plasma | Ir, La, Ni, Ru, Mo, Ta, W, Nb, ... |
Trusted expertise since 1990
Based on many years of active research experience in the field of growth and doping applications our team develops and manufactures the OCTOPLUS O-200 and all essential components. Each product is assembled and carefully tested in-house. We are happy to discuss your MBE system specifications and give competent advice for your application.
The OCTOPLUS O-200 is in use in leading laboratories. On demand we transmit a detailed list of references. Please contact our sales department for further questions and specification information.
Technical specifications are subject to change without notice.
