Oxide MBE system with efficient differential pumping
- Applications for many oxide and metal materials
- 12 MBE source ports DN63CF/DN100CF
- Wide range of source options; compatible to multi-pocket e-beam evaporation
- wafer size up to 4"
- customized solutions possible for dedicated processes such as Template Oxides (STO/BTO) for Silicon Integration on wafers up to 300mm
- differential pumping options, either by individual pump on each cell or by a shared pumping manifold
- Ozone-resistant SiC substrate heater or CO2 laser substrate heating
- Ozone injection close to substrate
- In-situ characterization capability
- Professional support by PhD MBE experts
General Information
The OCTOPLUS O-600 is very thoroughly designed for oxide layer deposition. The unique design with effective differential pumping allows depositing oxide layers in high Oxygen or Ozone partial pressure without strong degeneration of the hot sources. The OCTOPLUS O-600 system can be easily adapted to small wafer segments as well as to 4inch wafers. The field-proven vertical chamber design of the OCTOPLUS O-600 plus various state-of-the-art components allow layer by layer precise MBE growth.
Outstanding features of the OCTOPLUS O-600 are the special design, high reliability and versatility of the system and its compactness. This makes it applicable for both wafer scale research and development and pilot production environment.
The standard version of the OCTOPLUS O-600 comprises 12 source ports. A rapid pump-down load lock chamber with a horizontal working transfer rod system allows easy substrate introduction without breaking the vacuum of the MBE chamber. Integration to a wafer transfer robot for fully automated substrate transfer is also available.
Options for OCTOPLUS O-600
- Additional load-lock and buffer chambers
- Wafer transfer system
- Sources: effusion cells, (multi-pocket) e-beam evaporators, organic precursor sources for hybrid MBE etc.
- Retractable sources for reloading without chamber venting and possibility of differentially pumping the sources
- Multiple turbomolecular pumps for differential pumping
- Ozone source with or without enrichment
- Oxygen plasma source
- Software / hardware control system
- In-situ characterization tools, e.g. ion gauge, Quartz Crystal Microbalance (QCM), pyrometer, RHEED, QMA
We provide different kinds of effusion cells, valved cracker sources, gas sources and substrate manipulators according to customers' requirements.
CO2 laser heating allows substrate heating up to more than
1400°C.
A backside metal coating of the substrate is not needed, since the CO2 laser light is strongly absorbed by various oxide
substrates.
Please see corresponding
paper .
A well-manageable in-situ characterization is obtained by using quartz micro-balance, RHEED systems or quadrupole mass analyzers (QMA).
We are happy to discuss your MBE system specifications and give competent advice for your application. Do not hesitate to contact us.
The OCTOPLUS O-600 is in use in leading laboratories. On demand we transmit a detailed list of references.
Technical Characteristics
| Base pressure | < 5x10-11 mbar (depends on pumping system) |
| Pumping | cryopump, turbopump, TSP or ion getter pump |
| Cooling Shroud | LN2 or other cooling liquid on request |
| Substrate heater temperature | up to 800°C, 1000°C or 1400°C |
| Substate size | up to 100mm diameter |
| Bakeout temperature | up to 200°C |
| Source ports | 12 source ports DN63CF/DN100CF. Port configuration is adapted to your source options. |
| Source types | effusion cells, e-beam evaporators, sublimation sources, valved cracker sources, gas sources |
| Shutters | soft-acting linear or rotary shutters |
| In-situ monitoring | ion gauge, QCM, pyrometer, RHEED, QMA |
| Sample transfer | linear transfer rod, manual or semi-automatic |
| Load lock | turbo-pumped, magazine with 6 substrates |
| Control software | Tiny Tusker |
| Service | system installation and acceptance testing |
| MBE training | by MBE experts with extensive application know-how |
Examples for applications and corresponding sources
| Material System | Effusion Cells | Sublimation Sources | Valved / Cracker Sources | Plasma Sources | E-Beam evaporators |
|---|---|---|---|---|---|
| Products | WEZ NTEZ HTEZ | SUKO SUSI HTS DECO | Metal-organic source | FMP RFP | EBVV EBVM EBV |
| Perovskite Oxides | Sr, Ba, Ca, Al | C | TTIP | O-plasma | Ti, La |
| High-Tc Cuprates | Ba,Cu,Sr,Y,Pr ... | Ozone, O-plasma | La,Y,Pr, ... | ||
| Ferroelectric Oxides (STO/BTO) | Pb, Fe, Bi, Ba, ... | TTIP | Ozone, O-plasma | Ti ... | |
| Magnetic Oxides | Sr, Gd, Cr, La, Fe ... | TTIP | Ozone, O-plasma | La, Ti ... | |
| Ultra-wide band gap oxide | Ga, Al, Zn, In, Sn, Ge | Si | Ozone, O-plasma, O+N-plasma | La ... | |
| Transition Metal Oxides | Fe, Ni, Mn, Bi, Eu, ... | C | Ozone, O-plasma | Ir, La, Ni, Ru, Mo, Ta, W, Nb, ... |
Trusted expertise since 1990
Based on many years of active research experience in the field of growth and doping applications our team develops and manufactures the OCTOPLUS O-600 and all essential components. Each product is assembled and carefully tested in-house. We are happy to discuss your MBE system specifications and give competent advice for your application.
The OCTOPLUS O-600 is in use in leading laboratories. On demand we transmit a detailed list of references. Please contact our sales department for further questions and specification information.
