UHV compatible, low outgassing
High flux rates of low vapour pressure materials
Hearth volumes: 40 cm³ or 100 cm³
Long filament lifetime
Optimized versions for SiGe MBE available
The Standard Electron Beam Evaporator EBV is an evaporation source intended to achieve high growth rates for low vapour pressure materials, especially when high purity of the evaporant is desired. Large hearth capacities ensure a long system up-time before evaporant is depleted.
Single pocket Cu-hearth, capacity 100 cm³
Principle of e-beam evaporator operation
EBV evaporators are designed for high rate evaporation of low-vapour-pressure materials, especially when high purity of the evaporant is desired. They are frequently used for evaporation of refractory metals, e.g. Mo, Nb, Ta, W, Zr, it is well suited for high-rate evaporation of Al, and of course also for semiconductors like Si and Ge. A typical application of the EBV is SiGe MBE.
For application in a silicon MBE system we provide a specially adapted set of shielding parts manufactured from high-purity single-crystalline silicon. These plates and rings cover all parts of the metallic body that are potentially subject to electron or ion bombardment and that face the substrate. Only this Si-shielding allows the growth of highest purity Si-based films with virtually no metallic contamination. We also supply high purity Si source material in superior quality, machined from wafer-grade Si-single crystals, fitting the evaporator hearth closely.
For germanium evaporation with the EBV 200-100, a crucible liner made from high purity silicon is available. Ge does not sublime, but has to be molten completely for evaporation. To prevent it from interacting with the copper hearth, this "Si-crucible" is used, leaving a capacity of about 50 cm³ for the Ge evaporant.
For metal deposition the EBV can be used "as is" for all metals that do not melt completely or that do not react with the cooled Cu-wall. For some metals, graphite- or other metal crucible-liners are used. Ask for the solution for your particular evaporant.
||DN150 CF (O.D. 8"), DN200 CF (O.D. 10") or DN250 CF (O.D. 12")|
|Filament type||short-legged coil of thick W wire, electron emitting filament|
|Operating pressure||1 × 10-11 mbar ….1 × 10-5 mbar|
|Acceleration voltage||4 - 10 kV|
|Beam power||max. 10 kW, (3 kW; 5kW; depending on power supply)|
|Filament current||max. 50 A at 10 V (AC)|
|Spot size||5 mm diameter, approx|
|Primary beam deflection||270° by permanent magnet system|
|Dymamic beam deflection||coils wound from KAPTONTM - isolated wire;
x-deflection current: ± 3 A; y-deflection current: ± 3 A;
deflection frequency: max. 150 Hz
|Bakeout temperature||200°C (all air side connectors removed)|
|Cooling||water cooling, connectors SwagelokTM 8mm (air side);
water flow min 8 l/min at 3 bar
|Crucibles||40 cm³ or 100 cm³ hearth volume|
|Options||water cooling hood with custom apertures integrated on base flange (K);
integrated custom-made source shutter (S) with optional drive unit LSM 40-100;
integrated refill unit ERU 16 (R)
The most commonly used crucible material is PBN; other materials are available as required. Please refer to the Selection Guide or inquire for detailed recommendations. For information on crucibles see Crucibles.
|Schematic drawing of the Standard Electron Beam Evaporator EBV
(Drawing shows EBV 200-100-S)
For general information on CF mounting flanges see Flange and Gasket dimensions.
|[cm³]||[mm] / [mm]||[kW] / [mA]||Product code|
|EBV||150 -||40 -||LxxxD150||10 / 1000||HV|
|EBV||150 -||100 -||LxxxD150||10 / 1000||HV|
|EBV||200 -||40 -||K||S *||R** -||LxxxD195||10 / 1000||HV|
|EBV||200 -||100 -||K||S*||R**-||LxxxD195||10 / 1000||HV|
|EBV||250 -||40 -||K||S *||R**-||LxxxD245||10 / 1000||HV|
|EBV||250 -||100 -||K||S*||R**-||LxxxD245||10 / 1000||HV|
|*||manual or automated shutter actuation (with LSM 40-100)|
|**||Si recharge block Ø36x20, mass 45g|
|***||specify UHV length L with order|
e.g. EBV 200-40-KS-L250D195
is a standard electron beam evaporator on DN200 CF flange with 40cm³ hearth capacity, water cooling hood and integrated linear shutter, in-vacuum length 250mm and diameter 195mm.