Oxygen resistance option available for most wire heater effusion cells
Applicable in oxide MBE systems with chamber pressures up to several mbar
Nickel alloy wire heaters up to 1000°C
Noble metal alloy wire heaters up to 1200°C
Ultimate oxygen resistance by use of platinum shielding
Optional on-flange integrated cooling shroud and shutter
Oxygen Resistant Effusion Cells OREZ meet the requirements of oxide MBE and other vaccum applications with high oxygen background pressure. OREZ cells are typically employed in systems with a working pressure from 10-4 to several mbar and can be used up to 1200°C, e.g. for growth of ZnO layers. |
![]() OREZ with dual filament heater, suitable for different crucible shapes with capacities of 60 cm³, 80 cm³ and 125 cm³ |
A steadily increasing number of applications requires robust, reactive gas resistant equipment for material deposition, often employed in combined UHV and reactive gas process steps carried out in one vacuum system.
OREZ cells are therefore designed to operate in a pressure range from UHV up to nearly atmospheric pressure. Best performance is achieved in a pressure range from 10-6 to 10-3 mbar.
Typical applications are the formation of oxide layers by surface oxidation, growth of oxide films by evaporation of metals in oxygen atmosphere, and direct evaporation of oxides. Surface oxide layers and thin films are widely used as insulator materials, e.g. in microelectronic devices. Thick oxide films are often used in sensors and optical devices, due to the multifaceted optical, magnetic, electrical and semiconductive properties of oxides.
Note: For chamber pressures below 10-6 mbar we recommend using standard UHV effusion cells (WEZ, NTEZ, etc.). For higher pressures above 10-3 mbar it should be taken into account that due to the very short free path length of the evaporated molecules one leaves the molecular beam regime. In both cases please inquire for more advice.
Technical data |
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Filament type | Ni alloy (Tmax = 1000°C) or noble metal alloy (Tmax = 1200°C) wire heating filament: standard (SF), hot lip (HL), cold lip (CL), dual (DF) |
Thermocouple | NiCr/NiAl (type K) |
Operating temperature | 200-1200°C (depending on filament material and operation conditions) |
Outgassing temperature | 1000 / 1200°C (depending on filament material) |
Bakeout temperature | 250°C |
Cooling | integrated water cooling or separate cooling shroud |
Crucibles | 10-125 cm³; PBN, Al2O3, BeO crucibles (other materials on request) |
Options | integrated water cooling (K), integrated rotary shutter (S) |
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Schematic drawing of the Oxygen Resistant Effusion Cell OREZ (drawing shows OREZ 40-10-22-KS) |
For general information on CF mounting flanges see Flange and Gasket dimensions.
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[cm³] | [mm] | Type | Type | [mm] / [mm] | [W] / [A] | Product code | Product code | ||||||||
OREZ | 40 - | 10 - | 22 - | S - | Ni¹ / | Ni² - | SF³ - | K - | P - | LxxxD34 | 120 / 7 | PS 30-10 | PBN 10-22 | ||
OREZ | 40 - | 10 - | 22 - | K | S - | Ni¹ / | Ni² - | SF³ - | K - | P - | LxxxD36 | 120 / 7 | PS 30-10 | PBN 10-22 | |
OREZ | 40 - | 35 - | 34 - | S - | Ni¹ / | Ni² - | SF³ - | K - | P - | LxxxD34 | 180 / 9 | PS 30-10 | PBN 35-34 | ||
OREZ | 40 - | 35 - | 37 - | Ni¹ / | Ni² - | SF³ - | K - | P - | LxxxD37 | 200 / 10 | PS 30-10 | PBN 35-37 | |||
OREZ | 40 - | 60 - | 37 - | Ni¹ / | Ni² - | SF³ - | K - | P - | LxxxD38 | 240 / 10 | PS 30-10 | PBN 60-37 | |||
OREZ | 63 - | 35 - | 34 - | K | S - | Ni¹ / | Ni² - | SF³ - | K - | P - | LxxxD58 | 180 / 9 | PS 30-10 | PBN 35-34 | |
OREZ | 63 - | 35 - | 37 - | K | S - | Ni¹ / | Ni² - | SF³ - | K - | P - | LxxxD54 | 200 / 10 | PS 30-10 | PBN 35-37 | |
OREZ | 63 - | 60 - | 37 - | S - | Ni¹ / | Ni² - | SF³ - | K - | P - | LxxxD38 | 240 / 10 | PS 30-10 | PBN 60-37 | ||
OREZ | 63 - | 60 - | 37 - | K | S - | Ni¹ / | Ni² - | SF³ - | K - | P - | LxxxD58 | 240 / 10 | PS 30-10 | PBN 60-37 | |
OREZ | 63 - | 60 - | 54 - | S - | Ni¹ / | Ni² - | SF³ - | K - | P - | LxxxD55 | 300 / 10 | PS 40-19 | PBN C60-54 | ||
OREZ | 63 - | 125 - | 54 - | S - | Ni¹ / | Ni² - | SF³ - | K - | P - | LxxxD55 | 300 / 10 | PS 40-19 | PBN 125-54 |
* | rotary shutter possible on same flange | ¹ | Pt alloy wire filament on request | |
** | no standard, inquire for your particular solution | ² | Pt foil shielding on request | |
*** | specify UHV length L with order | ³ | alternatively CL, HL or DF |
Product code:
e.g. OREZ 40-10-22-S-Pt/Ni-HL-K-B-L287D34
is an oxygen resistant effusion cell on DN40 CF-flange for a 10cm³ crucible (lip Ø 22mm), integrated rotary shutter, Pt foil shielding, Ni alloy wire hot lip filament, type K thermocouple, BeO crucible, in-vacuum length 287mm and diameter 34mm.