MBE Components, Free Microplasma Source FMP

FMP

Free Microplasma Source

 

FMP 40
FMP 40 Free Microplasma Source with optional gas supply on DN40CF (O.D. 2.75") flange
  • O2 Standard version on DN40CF flange; DN63CF flange size with ion sensor option

  • Typical operation Power and Frequency: 5 - 20 W / 2.5 GHz

  • Typical gas flow : 1.5 to 4 sccm

  • Suitable for different gas types ( for example N2, H2 or O2)

  • Options: ion sensor, gas supply, power supply

 

The Free Microplasma Source FMP produces a pure localized plasma at the tip. This setup provides high purity plasma creation with effectively reduced wall interaction as well as a drastically reduced RF power consumption due to the small plasma size.

 

Main advantages of the FMP:

  • Free microplasma in front of injector, i.e.: reduced reactions with cavity materials

  • Cold plasma (low ion energy)

  • Multi-gas applications are possible

  • Wide gas flux range without reconfiguration: 1.4 - 4 sccm

  • Near-field pressure in process chamber 10-6 mbar to 10-2 mbar possible without reconfiguration

  • No water cooling needed due to high efficiency plasma generation

  • Very low HF power needed due to microplasma

  • Simple and reliable operation

  • Compact setup on DN40CF (O.D. 2.75") mounting flange

 

Application

The Free Microplasma Source FMP provides a pure localized plasma for substrate cleaning applications, surface preparation or layer growth within an UHV chamber or MBE system at low chamber pressure.

 

Technical data

Mounting flange
DN40CF (O.D. 2.75”) /
DN63CF (O.D. 4.5”) with ion sensor option
Thermocouple NiCr/NiAl (type K)
Operating temperature up to 300°C
Bakeout temperature 250°C
Cooling
not required
In vaccum length L 270 mm
In vacuum maximum total length TL 282 mm
In vaccum inner diameter D 35 mm
Maximum airside length OL
517 mm
Maximum airside radius AR 196 mm
Options all-metal valve, ion sensor, gas supply, RF generator 

 

Dimensions

Schematic drawing FMP Schematic drawing of the Free Microplasma Source FMP

(drawing shows FMP 40
with optional ion sensor and gas supply)

 

Specific data

For general information on CF mounting flanges see Flange and Gasket dimensions.

images/header_filament_current.gif images/header_filament_voltage.gif
[mm] [mm] / [mm] [W]   [A] [V]
FMP 40- L270 / D35 <200 < 15 < 15
*** specify UHV length L with order

 

Product code:

e.g. FMP 40-L270D32

is a free microplasma source on DN40CF flange with UHV-length 270 mm and in-vacuum diameter 35 mm.