WH 40
Loadlock Heater
WH 40 Loadlock Heater
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Tantalum or Tungsten heater
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Wafer or chamber temperatures according to setup (~400°C)
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Clean operation and high reliability
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Suitable for substrate sizes from 1" to 6"
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Customized solutions available
The main purpose of the Loadlock Heater WH 40 is the controlled heating of the chamber walls and also of substrates within a vacuum chamber under high to ultra-high vacuum conditions.
The heater concept is based on the reliable and well-known Standard Effusion Cells WEZ.
Application
WH 40 Loadlock Heaters are usually employed in research type UHV systems for heating substrates and / or chamber walls.
Technical data |
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| Filament type | Ta or W wire heating filament |
| Thermocouple | W5%Re/W26%Re (type C) or Chromel/Alumel (type K) |
| Operating temperature | 700°C - 800°C |
| Bakeout temperature | 250°C |
| Mounting flange | DN40CF (O.D. 2.75") |
| Dimensions |
L,D customer specific, OL=107 mm, AR= 54 mm |
Dimensions
Specific data
For general information on CF mounting flanges see Flange and Gasket dimensions.
If you are interested in a WH 40 Loadlock Heater, please contact us for more information.
Related products
The following list provides suggestions for related products. For additional product suggestions or more detailed information, please contact us.
Accessories
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| Power Supply PS |
Systems
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| OCTOPLUS 300 | OCTOPLUS 400 | OCTOPLUS 600 |
