Tantalum or Tungsten heater
Wafer or chamber temperatures according to setup (~400°C)
Clean operation and high reliability
Suitable for substrate sizes from 1" to 6"
Customized solutions available
The main purpose of the Loadlock Heater WH 40 is the controlled heating of the chamber walls and also of substrates within a vacuum chamber under high to ultra-high vacuum conditions.
The heater concept is based on the reliable and well-known Standard Effusion Cells WEZ.
WH 40 Loadlock Heaters are usually employed in research type UHV systems for heating substrates and / or chamber walls.
Technical data |
|
Filament type | Ta or W wire heating filament |
Thermocouple | W5%Re/W26%Re (type C) or Chromel/Alumel (type K) |
Operating temperature | 700°C - 800°C |
Bakeout temperature | 250°C |
Mounting flange | DN40CF (O.D. 2.75") |
Dimensions |
L,D customer specific, OL=107 mm, AR= 54 mm |
For general information on CF mounting flanges see Flange and Gasket dimensions.
If you are interested in a WH 40 Loadlock Heater, please contact us for more information.