Omicron MULTIPROBE MBE for 2'' wafer, deposition chamber with 14'' cluster flange, up to seven ports for effusion cells
In-situ MBE growth and surface analysis in a single system
STM, AFM, XPS, UPS, AES, LEED...
State-of-the-art vacuum and growth specifications
Software/hardware control system
Various wafer sizes from small sample plate up to 4'' wafer
Liquid nitrogen cooling shroud
Substrate temperatures up to 1250°C on wafer
The combination of OMICRON's wide range of multi-technique surface analysis systems for scanning probe microscopy and electron spectroscopy with the sophisticated MBE technology from Dr. Eberl MBE-Komponenten GmbH offers a new level of MBE / Analysis performance on wafer samples up to 4'' in diameter.
Omicron MULTIPROBE MBE systems allow observation and precise surface characterization during the growth process or between growth steps on a nanometer scale at any stage of the procedure without intermediate exposure of the sample to ambient conditions. The modular concept of the systems and the flexibility of the MBE source design enables the optimum realisation of customer specific configurations.
Omicron MULTIPROBE MBE for Si andSi/Ge research; 4'' wafer handling system, flexible combination of two electron beam evaporators and up to eight effusion cells or doping sources
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