Octoplus-O 400, MBE Systems

OCTOPLUS-O 400

Oxide MBE System 

Octoplus-O 400
  • Oxide MBE System with dual zone design

  • Applications for many oxide and metal materials

  • 9 MBE source ports DN63CF (O.D. 4.5"), extendible to 12 ports

  • Wide range of source options; compatible to to multi-pocket e-beam evaporation

  • Small samples or wafer sizes up to 2"

  • Strong differential pumping

  • Ozone-resistant SiC substrate heater

  • Ozone injection close to substrate

  • In-situ characterization capability

  • Strong support by PhD MBE experts

MBE system OCTOPLUS-O 400  

The OCTOPLUS-O 400 is  very thoroughly designed for oxide layer deposition. The unique dual zone design with efficient differential pumping allows depositing oxide layers in high Oxygen or Ozone partial pressure without strong degeneration of the hot sources. The OCTOPLUS-O 400 system can be easily adapted to small wafer segments as well as to 2 inch wafers. The field-proven vertical chamber design of the OCTOPLUS-O 400 plus various state-of-the-art components allow layer by layer precise MBE growth.

Outstanding features of the OCTOPLUS-O 400 are the unique dual zone design, high reliability and versatility of the system and its compactness. These features make our systems particularly suited for applications in research and development. Nonetheless specific production processes are also covered.

The standard version of the OCTOPLUS-O 400 comprises 12 source ports 4.5 inch (DN63CF) flange size. 
A rapid pump-down load lock chamber with a horizontal working transfer rod system allows easy substrate introduction without breaking the vacuum of the MBE chamber.

Options for OCTOPLUS-O 400:

  • Additional load-lock and buffer chambers

  • Wafer transfer system

  • Sources: effusion cells, (multi-pocket) e-beam evaporators, etc.

  • Retractable sources for reloading without chamber venting

  • Upgrade from 9 ports up to 12 ports

  • Multiple turbomolekular pumps for differential pumping

  • Ozone source with or without enrichment

  • Oxygen plasma source

  • Software / hardware control system

  • In-situ characterization tools, e.g. ion gauge, quartz, pyrometer, RHEED, QMA

Ozone Source
Compact Ozone Source without enrichment up to 15% O3

We provide different kinds of effusion cells, valved cracker sources, gas sources and substrate manipulators according to customers' requirements. A well-manageable in-situ characterization is obtained by using quartz micro-balance, RHEED systems or quadrupole mass analyzers (QMA). 

We are happy to discuss your MBE system specifications and give competent advice for your application. Do not hesitate to contact us.

The OCTOPLUS-O 400 is in use in leading laboratories. On demand we transmit a detailed list of references.

Zone 1 (blue coloring):

  • Oxide deposition area

  • High O2 and O3 partial pressure

  • Ozone injector ring close to substrate

  • Short distance of Ozone injector to substrate

  • Low Ozone consumption

  • Ozone resistant SiC heater

  • Strong differential turbo pumping


Zone 2 (yellow coloring):

  • Source area

  • Low pressure due to small opening towards zone 1

  • Separate strong turbo pump

  • Pressure significantly lower than in zone 1

  • Shutters with low flux transient

  • Low efficient individual differential pumping of each source not needed

  • Integration of multi-pocket e-beam evaporator possible


Schematic Octoplus-O 400

Schematic of OCTOPLUS-O 400 Oxide MBE System


Octoplus-O 400 general view

Complete OCTOPLUS-O 400 MBE System 

Product range and quality of Dr. Eberl MBE-Komponenten GmbH benefit from the many years of active research experience of its team members. We now look back on over 25 years of developing and manufacturing of complex systems and components for multiple tasks in the applied research and production of compound semiconductor materials. Each product is assembled and carefully tested in-house by our MBE experts.