Oxide MBE System with dual zone design
Applications for many oxide and metal materials
9 MBE source ports DN63CF (O.D. 4.5"), extendible to 12 ports
Wide range of source options; compatible to multi-pocket e-beam evaporation
Small samples or wafer sizes up to 2"
Strong differential pumping
Ozone-resistant SiC substrate heater
or CO2 laser substrate heating
Ozone injection close to substrate
In-situ characterization capability
Strong support by PhD MBE experts
The OCTOPLUS-O 400 is very thoroughly designed for oxide layer deposition. The unique dual zone design with effective differential pumping allows depositing oxide layers in high Oxygen or Ozone partial pressure without strong degeneration of the hot sources. The OCTOPLUS-O 400 system can be easily adapted to small wafer segments as well as to 2 inch wafers. The field-proven vertical chamber design of the OCTOPLUS-O 400 plus various state-of-the-art components allow layer by layer precise MBE growth.
Outstanding features of the OCTOPLUS-O 400 are the unique dual zone design, high reliability and versatility of the system and its compactness. These features make our systems particularly suited for applications in research and development. Nonetheless specific production processes are also covered.
The standard version of the OCTOPLUS-O 400 comprises 9 source ports 4.5 inch (DN63CF) flange size. A rapid pump-down load lock chamber with a horizontal working transfer rod system allows easy substrate introduction without breaking the vacuum of the MBE chamber.
Options for OCTOPLUS-O 400:
Additional load-lock and buffer chambers
Wafer transfer system
Sources: effusion cells, (multi-pocket) e-beam evaporators, etc.
Retractable sources for reloading without chamber venting
Upgrade from 9 ports up to 12 ports
Multiple turbomolecular pumps for differential pumping
Ozone source with or without enrichment
Oxygen plasma source
Software / hardware control system
In-situ characterization tools, e.g. ion gauge, quartz, pyrometer, RHEED, QMA
Compact Ozone Source without enrichment up to 15% O3
We provide different kinds of effusion cells, valved cracker sources, gas sources and substrate manipulators according to customers' requirements.
Al2O3 substrate heated by CO2 laser. (Courtesy of Prof. J. Mannhart, MPI-FKF Stuttgart)
We are happy to discuss your MBE system specifications and give competent advice for your application. Do not hesitate to contact us.
The OCTOPLUS-O 400 is in use in leading laboratories. On demand we transmit a detailed list of references.
Zone 1 (blue coloring):
Oxide deposition area
High O2 and O3 partial pressure
Ozone injector ring close to substrate
Short distance of Ozone injector to substrate
Low Ozone consumption
Ozone resistant SiC heater
Strong differential turbo pumping
Zone 2 (yellow coloring):
Low pressure due to small opening towards zone 1
Separate strong turbo pump
Pressure significantly lower than in zone 1
Shutters with low flux transient
Low efficient individual differential pumping of each source not needed
Integration of multi-pocket e-beam evaporator possible
Product range and quality of Dr. Eberl MBE-Komponenten GmbH benefit from the many years of active research experience of its team members. We now look back on about 30 years of development and manufacture of complex systems and components for multiple tasks in the applied research and production of compound semiconductor materials. Each product is assembled and carefully tested in-house by our MBE experts.