Thin Film Systems, MBE Systems, PVD Applications

Thin Film Systems

Octoplus 500 for PVD Applications


CIGS System
Deposition chamber of a CuInGaSe R&D System
  • State-of-the-art MBE system, optimized for PVD applications

  • Up to 12 source ports

  • Large capacity sources for CIGS, Kesterite or CdTe deposition

  • Fast ramping source for sharp composition profile deposition on request

  • Substrate size up to 6 inch, or 100mm x 100 mm

  • Turbo molecular pumped growth chamber with reactive material trap

  • Base pressure in 10-10 mbar range, lower on request

  • Uniformity of layers  better +/-1% in thickness and composition

  • Software allows fully automated layer by layer growth with growth recipes, cell ramping  data logging. etc.

  • Fast entry load-lock with 5-10 samples in a lift-magazine

  • The loadlock can be pumped down <10-6 mbar in less than 25min. Base pressure is in the 10-9mbar range

  • This PVD system is well optimized and has shown excellent results in the field


The Thin Film deposition system is based on our OCTOPLUS 500 chamber. It is a versatile and very thoroughly designed MBE system, ideally suited compound semiconductor material deposition.

Beside the installation we also offer, extensive testing and field training by PhD experts at customers site. For example, it also includes the deposition of CIGS layers  using 3-stage process on glass substrate with Moly layer.

For the case of CIGS systems we provide special large capacity Se resistant effusion cells and valved cracker sources for Selenium and Sulfer. The substrate manipulator allows well controlled substrate heating and manipulation up to 6 inch diameter or 10cm x 10cm size. The proven MBE software EpiSoft controls all shutters, cell- and manipulator temperatures, substrate rotation, the chamber pressure and other features. Excellent operation reproducibility and safety is guaranteed.

view into deposition system

View into the deposition system, wafer and port to the deposition chamber are visible


The standard version of the OCTOPLUS 500 comprises up to 10 source ports with 4.5 inch (DN 63) and 6inch, (DN 100) flange size. Bellow-free soft-acting linear shutters are offered with very long life-time. The shutters provide 0.2sec open and closing time.A rapidly pump-down load lock chamber with a horizontal working transfer rod system allows easy substrate introduction without breaking the vacuum of the MBE chamber.

We are happy to discuss your MBE system specifications and give competent advice for your application.
The OCTOPLUS 500 is in use in leading laboratories. Record CIGS solar cell efficiencies have been demonstrated with this system by our customers. On demand we transmit a detailed list of references. Please contact our sales department for further questions and specification information.

PEZ-W 63-160-60-DF

PEZ-W 63-160-60-DF, Selenium resistant deposition source for copper, indium and gallium


Product range and quality of Dr. Eberl MBE-Komponenten GmbH benefit from the many years of active research experience of its team members. We now look back on about 30 years of development and manufacture of complex systems and components for multiple tasks in the applied research and production of compound semiconductor materials. Each product is assembled and carefully tested in-house by our MBE experts.


Information about material capacity of the PEZ-W 63-160-60-DF

density minimum maximum
copper 8,954 g/cm3 98 g 877g
indium 7,31 g/cm3 95 g 819 g
gallium 5,904 g/cm3 77 g 661 g



VSCS-63-160-60, Valved Cracker Source for Selenium with Valve Controller MVCU and Power Supplies

  • Precise and fast flux control

  • Capacity 300 and 500 ccm

  • Large opening cross section valve mechanism

  • Flux modulation and on/off control

  • Water cooling