Wafer-scale PVD system
Compact and versatile research PVD system with ultra-small footprint
- Substrate size 300 mm
- Large capacity electron beam evaporators up to 1000ccm
- Wide range of source options
- Turbomolecular pump
- Fast-entry chamber for rapid substrate loading
- Effective UHV pumping system
- Water cooled chamber body, no LN2 infrastructure needed
- Low energy consumption, economic operation, minimal site requirements
- In-situ monitoring capability
- Professional support by PhD experts
General Information
The PVD 550 system is ideally suited for material deposition on large samples. It provides good access and easy operation and maintenance. The chamber design of the various state-of-the-art components allow layer by layer precise growth. Our company has a long experience in simulation of the deposition processes which allows us to optimize the source arrangement for you to achieve more layer from your source material while maintaining excellent homogeneity profile on the substrate.
Outstanding features of the PVD 550 are the high reliability and versatility of the system and its small footprint. These features make the system particularly suited for applications in research and development. Its ultra compact footprint allows it to be integrated in tight laboratory spaces with other existing UHV surface processing equipment.
A rapid pump-down load lock chamber with a horizontally working transfer-rod system allows the user an easy substrate introduction without breaking the vacuum of the chamber. The transfer system can be easily adapted to integrate with other substrate handling equipment or inert air glovebox compartments.
We provide different kinds of effusion cells, gas sources and substrate manipulators according to all our customers’ requirements. A well-manageable in-situ monitoring is obtained by using beam-flux-gauges, pyrometers, or quadrupole mass analyzers (QMA).
We are happy to discuss your system specifications and give competent advice for your application. Do not hesitate to contact us.
Options
- Substrate manipulator upgrades for corrosion resistance in special environments
- RGA, quartz-microbalance
- Magazine in fast-entry lock
- With optional port for sample extraction into vacuum suitcase
- Preparation chamber, integration to cluster systems or other vacuum environments
- Pumping system (turbopumps, cryopumps etc.)
- Control system
Technical Data
| Base pressure | < 5x10-7 mbar, lower pressures possible with optional bakeout |
| Pumping | turbopump, cryopump |
| Cooling | water cooled chamber |
| Substrate heater temperature | up to 1200°C, continuous substrate rotation |
| Substate size | 300mm wafers or adapters for smaller substrates |
| Bakeout | Availiable as an optional accessory |
| Source types | effusion cells, e-beam evaporators, gas sources, magnetron sputtering sources |
| In-situ monitoring | ion gauge, QCM, pyrometer, QMA, ellipsometry |
| Sample transfer | linear transfer rod (manual) |
| Load lock | Fast-entry chamber with fork for a single substrate. Optional cassette storing multiple substrates |
| Control software | Tiny Tusker |
| Service | system installation and acceptance testing |
Trusted expertise since 1990
The product range and quality of Dr. Eberl MBE-Komponenten GmbH benefit from many years of active research experience of its team members.
We now look back on about 35 years of development and manufacture of complex systems and components for multiple tasks in the applied research and production of compound semiconductor materials. Each product is assembled and carefully tested in-house by our Deposition experts.
