10x10 mm² substrate, max. 6 ports
10x10 mm² substrate max. 9 ports
up to 2-inch substrate, max. 8 ports
up to 4-inch substrate, max. 12 ports
up to 6-inch substrate, max. 12 ports
MBE system for multi-wafer capability
MBE system for 300 mm silicon wafer
PVD system for 100 mm wafers
PVD system for 300 mm wafers
Thermal evaporation up to 2000°C
Deposition by powerful electron beam
Sample manipulators and wafer heaters
Evaporation with enhanced flux control
Sources for p- and n-type doping
Thermal and plasma gas crackers
Evaporators for R&D and industry
Evaporators for volatile molecules
Multiple crucibles on a single flange
PVD effusion cells for different...
Annealing oven for 10x10mm² samples
Bayard-Alpert type ionization gauges
Quartz Crystal Microbalance
Water and LN2 cooled adapters
Overview of crucible shapes and sizes
Electronic control equipment
Rotary and linear shutter equipment
Power and thermocouple cables
Individually designed parts
SiGe and compound semiconductor devices
Explore new and exotic electronic states
Quantum-dots/-wires, roll-up-/nano-tubes
CIGS, CZTS and CdTe applications
Magnetic material devices
Single layers of atoms or molecules
Metallization of substrates by PVD
Electronics based on organic molecules
Superconductors and high-k dielectrics
Contact our support team
Simulation for flux and uniformity
In case of technical problems
Schematic drawings and dimensions
Dr. Eberl MBE-Komponenten GmbH
Job advertisements - Stellenanzeigen
Stay up to date with the latest news
List of upcoming conferences
Customer References, Solutions & Patents
Terms simply explained
Terms and Conditions - AGB
Headquarters and Representatives
Select on Periodic Table
Select by Vapor Pressure Data
Select by Element and Compound
Crucibles used in our MBE sources
Information about how to request
EBV
vapor pressure is approximated for the shown pressure range according to P[mbar]=10(A-B/T[K])
Technical specifications are subject to change without notice.
