Dual Cluster Source DCS

The use of source clusters increases the capacity of your UHV-System, by using only a single port for two individual sources.
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  • Cluster sources increase the capacity of UHV systems
  • Customized with two independent and different types of effusion cells on a single flange
  • Two individual shutters or multi-position shutter and additional cool tube available
  • Minimized temperature crosstalk because of effective integrated water cooling
  • Various crucible types and sizes available
  • Very compact cell design
  • Surprisingly low power consumption  Datasheet

Introduction

The picture above presents a Dual Cluster Source typically used for organic material or for metal evaporation with evaporants like Au, Ag, Bi, Ga, In, etc.

DCS 40-2x1-14-S
Dual Cluster Source DCS 40-2x1-14-S with multi-position rotary shutter and quartz crucibles on DN40CF (O.D. 2.75'') flange
DCS multi-position shutter
Dual Cluster Source DCS 40-2x1-14-S with multi-position rotary shutter and crucibles of different material (PBN and PG)
DCS multi-position shutter
Dual Cluster Source DCS 40-2x1-14-S with multi-position rotary shutter and crucibles of different material (PBN and PG)
DCS-2S
Two individual shutters of DCS 40-2x1-14-2S and crucibles of different material (PBN and Quartz)
DCS cool tube
DCS 40-2x1-14-S-T with multi-position rotary shutter and cupper cool tube attachment
DCS-2S
Two individual shutters of DCS 40-2x1-14-2S and crucibles of different material (PBN and Quartz)

Two independent cells with two 0.6 cm3 crucibles are tightly arranged on a single DN40CF (O.D. 2.75") flange. This compact design allows assembling two cells in only one single source port and thus increasing the capacity of the MBE system. Effective water cooling provides minimized temperature crosstalk between both cells. It is possible to run one cell e.g. at 1300°C while the other cell keeps its temperature at 150°C.

By default the “dual” cluster sources are designed as two-cell-clusters. However we are to supply customized solutions with three or more cells, e.g.,  Quad Cluster Sources QCS on a single mounting flange tailored to the customer’s need.

Dual Cluster Sources built on a DN40 CF (O.D. 2.75") flange comprise two crucibles and either one multi-position rotary motion shutter or two individual rotary shutters. Different crucible sizes, shapes, materials (see second foto on the right) and different thermocouples can be provided.

Dual Cluster Sources DCS 40-2x1-14-S with multi-position shutter

In this variant is implemented one multi-position rotary shutter for various open/closed shutter position combinations that can be regulated either manually or remote by a Multi-position Shutter Control Unit MSCU.

Dual Cluster Source DCS 40-2x1-14-2S with two individual shutters

Dual Cluster Source DCS 40-2x1-14-2S with two individual shutters

This solution comprises two independently adjustable non overlapping shutters that allow individual closing or opening and establish a further reduction of thermal interaction. They can shift positions within an ambient tube.
Both shutters can be regulated manually or remote by a Rotary Pneumatic Shutter Module RPM.

Dual Cluster Source DCS 40-2x1-14-S-T with multi-position shutter and cool tube

In order to shield the UHV chamber from spreading evaporant especially while evaporating organic material at low temperatures the cool tube is a reasonable option.
Diffuse evaporant material will deposit inside the cool tube wall while only the sharp beam in straight direction will hit the substrate in a well defined spot.

The cool tube option is available with two individual shutters, too.
( DCS 40-2x1-14-2S-T )

Application

The use of source clusters increases the capacity of your UHV-System, by using only a single port for two individual sources. In surface science application the product allows you to add material deposition features into your small sample preparation system or directly in a surface analysis system.

Both independent sources of the DCS are predestined for thin film applications or for doping applications (see DDS , the dual cluster cell that is explicitly optimized for doping applications ). Different thermocouple options for high temperature or low temperature heaters are available. Low temperature cells are used for organic material (type K or type C thermocouple).

Many combinations of effusion cells are possible within Source Clusters.
For particular combinations or special designs like tilted angle crucibles see Customized Source Clusters .

Technical Characteristics

Mounting FlangeDN40CF (O.D. 2.75")
In‑vacuum dimensionsLength : standard 220 mm (180-400 mm on request); Diameter : 36mm
Thermocouple, Temperature sensor (other types on request)Type K or Type C
Operating temperatureType K (Chromel/Alumel): 25-1000°C, Type C (W5%Re/W26%Re): 50-1400°C
Outgassing temperatureType K (Chromel/Alumel): 1100°C, Type C (W5%Re/W26%Re): 1500°C
Bakeout temperature250°C
Cooling / water coolingWater cooled block
Low temperature crosstalk: one cell 1300°C / second cell 150°C possible
Cooling water flow30 l/h
CruciblesPBN, Quartz, Al2O3 , etc.; Nominal charge 600 mm3
Optionsintegrated rotary shutter (S)
individual rotary shutters (2S)
Power500°C @ 7 W / 4 A, 1100°C @ 51 W / 7 A, 1500°C @ 112 W / 10 A

Technical Data

For general information on CF mounting flanges see Flange, Gasket and Tube Dimensions .
ProductFlange [CF]Nominal capacity
[cm³]
Lip diameter
[mm]
ShutterOptionsFilament typeThermocouple typeUHV dimensions
[mm] specify L with order
DCS402x114SSF, CLCLxxxD36
DCS402x114SSF, CLKLxxxD36
DCS402x1142SSF, CLCLxxxD36
DCS402x1142SSF, CLKLxxxD36
DCS402x114STSF, CLCLxxxD36
DCS402x114STSF, CLKLxxxD36
DCS402x1142STSF, CLCLxxxD36
DCS402x1142STSF, CLKLxxxD36

Example: DCS 40-2x1-14-S-T-SF-C-P-L220D36 is a dual cluster source on a DN40CF flange, with two 0.6cm 3 PBN crucibles (lip diameter 14 mm), integrated rotary shutter, cool tube, standard filament heaters, type C thermocouple, in-vacuum length 220 mm and diameter 36 mm.