- Tantalum or Tungsten heater
- Wafer or chamber temperatures according to setup (~400°C)
- Clean operation and high reliability
- Suitable for substrate sizes from 1" to 6"
- Customized solutions available
Introduction
The main purpose of the Loadlock Heater WH 40 is the controlled heating
of the chamber walls and also of substrates within a vacuum chamber
under high to ultra-high vacuum conditions.
The heater concept is based on the reliable and well-known Standard
Effusion Cells WEZ .
Application
WH 40 Loadlock Heaters are usually employed in research type UHV systems for heating substrates and / or chamber walls.
Dimensions
If you are interested in a WH 40 Loadlock Heater, please contact us for more information.
Technical Characteristics
| Mounting Flange | DN40CF (O.D. 2.75") |
| Airside dimensions | L,D customer specific OL=107 mm AR= 54 mm |
| Filament | Ta or W wire heating filament |
| Thermocouple, Temperature sensor (other types on request) | Type C or Type K |
| Operating temperature | 700°C - 800°C |
| Bakeout temperature | 250°C |
Technical specifications are subject to change without notice.
