substrate in OCTOPLUS 400 - Dr. Eberl MBE-Komponenten GmbH OCTOPLUS 400 systems are ideally suited for III-V, II-VI and other compound semiconductor applications. The OCTOPLUS 400 can be adapted to small wafer segments.
substrate in OCTOPLUS 500 - Dr. Eberl MBE-Komponenten GmbH The OCTOPLUS 500 system was developed for the growth of high quality III-V and II/VI heterostructures on 4 inch or 6 inch Si substrates.
substrate in Substrate Manipulators SH - Dr. Eberl MBE-Komponenten GmbH SH substrate manipulators are used in standard III-V MBE, GaN MBE, SiC growth and SiGe MBE. Heaters made from tungsten, tantalum, graphite and SiC are available.
substrate in Wafer Heater WH - Dr. Eberl MBE-Komponenten GmbH The wafer heaters or heated stations - WH - are suited for all substrate heating applications where the full functionality of a substrate manipulator is not required.
substrate in References - Dr. Eberl MBE-Komponenten GmbH References and information about who our customers are and how we try to support them with both standard or very special products.
substrate in OCTOPLUS-O 400 - Dr. Eberl MBE-Komponenten GmbH The OCTOPLUS-O 400 MBE system features a unique dual zone design with differential pumping that allows depositing oxide layers under high partial pressure.
substrate in OCTOPLUS 500 EBV - Dr. Eberl MBE-Komponenten GmbH The OCTOPLUS 500 EBV system has been developed for the growth of high quality Si/SiGe heterostructures on 4 inch or 6 inch Si substrates.