Glossary
For Rapid Thermal Processing (RTP) wafers are rapidly heated to high temperatures. These processes are used for a wide variety of applications in semiconductor manufacturing including dopant activation, thermal oxidation, metal reflow and chemical vapor deposition.
Our systems AO 500 /AO 600 for Rapid Thermal Processing are equipped for sample sizes up to 12 mm x 12 mm and a maximum temperature of 500°C / 600°C.
Our systems AO 500 /AO 600 for Rapid Thermal Processing are equipped for sample sizes up to 12 mm x 12 mm and a maximum temperature of 500°C / 600°C.
