Stichwort "Riber" in "Stichwort":
Riber in Power Supply and Temperature Control PS
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Keywords
Keyword: Riber
Riber in organic material evaporator
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Riber in mini evaporator
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Stichwort "Riber" in "Online Editor":
Riber in MBE-Components - Dr. Eberl MBE-Komponenten GmbH
Substrate manipulators, effusion cells, source clusters, doping cells, valved sources, e-beam evaporators, gas sources and proper equipment for R&D and industrial MBE applications.
Substrate manipulators, effusion cells, source clusters, doping cells, valved sources, e-beam evaporators, gas sources and proper equipment for R&D and industrial MBE applications.
Riber in Substrate Manipulation - Dr. Eberl MBE-Komponenten GmbH
The product range includes substrate manipulators and heated stages for MBE chambers.
The product range includes substrate manipulators and heated stages for MBE chambers.
Riber in Substrate Manipulators SH - Dr. Eberl MBE-Komponenten GmbH
SH substrate manipulators are used in standard III-V MBE, GaN MBE, SiC growth and SiGe MBE. Heaters made from tungsten, tantalum, graphite and SiC are available.
SH substrate manipulators are used in standard III-V MBE, GaN MBE, SiC growth and SiGe MBE. Heaters made from tungsten, tantalum, graphite and SiC are available.
Riber in Oxygen Resistant Substrate Manipulators SH-O - Dr. Eberl MBE-Komponenten GmbH
Using SiC or noble metal heaters, MBE-Komponenten offers substrate manipulators and heated stations that are resistant to oxygen or other corroding atmospheres.
Using SiC or noble metal heaters, MBE-Komponenten offers substrate manipulators and heated stations that are resistant to oxygen or other corroding atmospheres.
Riber in Wafer Heater WH - Dr. Eberl MBE-Komponenten GmbH
The wafer heaters or heated stations - WH - are suited for all substrate heating applications where the full functionality of a substrate manipulator is not required.
The wafer heaters or heated stations - WH - are suited for all substrate heating applications where the full functionality of a substrate manipulator is not required.
Riber in Effusion Cells - Dr. Eberl MBE-Komponenten GmbH
Effusion cells for different temperature scales, capacities, partly with thermal cracking or oxygen resistance as well as sublimation and decomposition sources.
Effusion cells for different temperature scales, capacities, partly with thermal cracking or oxygen resistance as well as sublimation and decomposition sources.
Riber in Standard Effusion Cell WEZ - Dr. Eberl MBE-Komponenten GmbH
WEZ Standard Effusion Cells are designed for evaporation or sublimation of a variety of elements and compounds in the temperature range from 700°C up to 1400°C.
WEZ Standard Effusion Cells are designed for evaporation or sublimation of a variety of elements and compounds in the temperature range from 700°C up to 1400°C.
Riber in Production Effusion Cell PEZ - Dr. Eberl MBE-Komponenten GmbH
PEZ Production Effusion Cells are designed to meet the particular requirements of production MBE systems, allowing the evaporation of a variety of elements.
PEZ Production Effusion Cells are designed to meet the particular requirements of production MBE systems, allowing the evaporation of a variety of elements.
Riber in OCTOPLUS 300 - Dr. Eberl MBE-Komponenten GmbH
The OCTOPLUS 300 system is ideally suited for material deposition onto small samples. It ensures a good accessability and easy operation and maintenance.
The OCTOPLUS 300 system is ideally suited for material deposition onto small samples. It ensures a good accessability and easy operation and maintenance.
Riber in OCTOPLUS-O 400 - Dr. Eberl MBE-Komponenten GmbH
The OCTOPLUS-O 400 MBE system features a unique dual zone design with differential pumping that allows depositing oxide layers under high partial pressure.
The OCTOPLUS-O 400 MBE system features a unique dual zone design with differential pumping that allows depositing oxide layers under high partial pressure.
Riber in OCTOPLUS 500 EBV - Dr. Eberl MBE-Komponenten GmbH
The OCTOPLUS 500 EBV system has been developed for the growth of high quality Si/SiGe heterostructures on 4 inch or 6 inch Si substrates.
The OCTOPLUS 500 EBV system has been developed for the growth of high quality Si/SiGe heterostructures on 4 inch or 6 inch Si substrates.
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