substrate in OCTOPLUS 400 - Dr. Eberl MBE-Komponenten GmbH OCTOPLUS 400 systems are ideally suited for III-V, II-VI and other compound semiconductor applications. The OCTOPLUS 400 can be adapted to small wafer segments.
substrate in OCTOPLUS 500 - Dr. Eberl MBE-Komponenten GmbH The OCTOPLUS 500 system was developed for the growth of high quality III-V and II/VI heterostructures on 4 inch or 6 inch Si substrates.
substrate in Thin Film Systems - Dr. Eberl MBE-Komponenten GmbH Our versatile thin film deposition system is based on the OCTOPLUS 500 chamber and ideally suited for PVD applications, including CIGS, CdTe and kesterites.
substrate in Substrate Manipulators SH - Dr. Eberl MBE-Komponenten GmbH SH substrate manipulators are used in standard III-V MBE, GaN MBE, SiC growth and SiGe MBE. Heaters made from tungsten, tantalum, graphite and SiC are available.
substrate in Wafer Heater WH - Dr. Eberl MBE-Komponenten GmbH The wafer heaters or heated stations - WH - are suited for all substrate heating applications where the full functionality of a substrate manipulator is not required.
substrate in References - Dr. Eberl MBE-Komponenten GmbH References and information about who our customers are and how we try to support them with both standard or very special products.
substrate in OCTOPLUS-O 400 - Dr. Eberl MBE-Komponenten GmbH The OCTOPLUS-O 400 MBE system features a unique dual zone design with differential pumping that allows depositing oxide layers under high partial pressure.
substrate in OCTOPLUS 500 EBV - Dr. Eberl MBE-Komponenten GmbH The OCTOPLUS 500 EBV system has been developed for the growth of high quality Si/SiGe heterostructures on 4 inch or 6 inch Si substrates.