Octoplus 400, MBE Systems

OCTOPLUS 400

Compact III/V, II/VI or other material MBE System 

System Octoplus 400
  • Compact and versatile MBE system for R&D

  • Applications: III-V, II-VI or HgCdTe epitaxy

  • 10 source ports, various options including e-beam evaporators

  • Wide range of source options

  • Horizontal substrates up to 3''

  • UHV pumping system with base pressure < 5 x 10-11 mbar

  • Ease of use and maintenance

  • In-situ characterization capability

  • Strong support by PhD MBE experts

MBE system OCTOPLUS 400 Data SheetDownload Icon

The OCTOPLUS 400 system is ideally suited for III-V, II-VI and other compound semiconductor material applications.The OCTOPLUS 400 system can be easily adapted to small wafer segments as well as to 1, 2 or 3 inch wafers. The field-proven vertical chamber design of the OCTOPLUS 400 plus various state-of-the-art components allow layer by layer precise MBE growth.

Outstanding features of the OCTOPLUS 400 are the high reliability and versatility of the system and its compactness. These features make the OCTOPLUS 400 system particularly suited for applications in research and development. Nonetheless specific production processes are also covered.

The standard version of the OCTOPLUS 400 comprises 8 source ports with 4.5 inch (DN63CF) flange size. Up to 10 source ports are possible in a custom designed version on request. A rapidly pump-down load lock chamber with a horizontal working transfer rod system allows easy substrate introduction without breaking the vacuum of the MBE chamber.

We provide different kinds of effusion cells, valved cracker sources, gas sources and substrate manipulators according to all our customers' requirements. A well-manageable in-situ characterization is obtained by using beam-flux-gauges, RHEED systems or quadrupole mass analyzers (QMA). The proven MBE software EpiSoft controls all shutters, cell- and manipulator temperatures, the chamber pressure and cyropump temperatures. Maximum operation reproducibility and safety is guaranteed.

We are happy to discuss your MBE system specifications and give competent advice for your application. Do not hesitate to contact us.

The OCTOPLUS 400 is in use in leading laboratories. On demand we transmit a detailed list of references.

Options for OCTOPLUS 400:

  • Additional load-lock or buffer chambers

  • Wafer transfer system

  • Effusion cells, source clusters, valved or gas sources, manipulators, power supplies and control units

  • Upgrade from 8 ports up to 10 ports

  • Pumping system (ion getter pumps, turbopumps, cryopumps etc.)

  • Software / hardware control system

  • In-situ characterization tools, e.g. ion gauge, quartz, pyrometer, RHEED, QMA


Technical Data

Size of deposition chamber
450 mm I.D.
Base pressure
< 5x10-11 mbar
Pumping Cryopump, Turbopump, TSP or Ion Getter Pump
Cooling Shroud LN2 or other cooling liquid on request
Substrate heater temperature up to 800°C, 1000°C or 1400°C
Substate size up to 3" diameter
Bakeout temperature up to 200°C
Source ports up to 10 ports DN63CF and DN100CF
Source types
effusion cells, e-beam evaporators, sublimation sources, valved cracker sources, gas sources
Shutters
soft-acting linear or rotary shutters
In-situ monitoring ion gauge, quartz, pyrometer, RHEED, QMA
Sample transfer linear transfer rod, manual or semi-automatic
Load lock magazine with 6 substrates turbo-pumped
MBE control software EpiSoft
Included system installation and acceptance testing
MBE training by MBE expert


Examples for applications and corresponding sources

Effusion Cell
WEZ, NTEZ
OME, HTEZ
Sublimation Source
SUKO, SUSI
HTS, DECO
Valved Source
VACS, VGCS
VCS, VSCS
Plasma Source

E-Beam
Evaporator
EBVV
III/V Ga, In, Al, Be C, Si doping As, P, Sb
II/VI Zn, Cd, Be S, Se, Te N-doping
IV Ge, Sn, Pb B, P, Sb doping Si, Ge
GaN Ga, In, Al N
Metals Cu, Al, Ni, Co, ... Pt, Ta, Pd, Mo, W
Topological Insulators Ge, Sn, Te, Bi, GeSb Se, Te B
Graphene / Silicene C, Si
Oxides Fe, Ni, Mn, Bi, Eu,
Ga, ...
O
Thin Film Solar Cells Cu, Ga, In, Zn, NaF,
Fe, Sn
S, Se

The product range and quality of Dr. Eberl MBE-Komponenten GmbH benefit from many years of active research experience of its team members.

We now look back on over 25 years of developing and manufacturing of complex systems and components for multiple tasks in the applied research and production of compound semiconductor materials. Each product is assembled and carefully tested in-house by our MBE experts.