Stichwort "chamber" in "Stichwort":
chamber in deposition stage
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Keywords
Keyword: chamber
chamber in manipulator
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Stichwort "chamber" in "Online Editor":
chamber in OCTOPLUS 400 - Dr. Eberl MBE-Komponenten GmbH
OCTOPLUS 400 systems are ideally suited for III-V, II-VI and other compound semiconductor applications. The OCTOPLUS 400 can be adapted to small wafer segments.
OCTOPLUS 400 systems are ideally suited for III-V, II-VI and other compound semiconductor applications. The OCTOPLUS 400 can be adapted to small wafer segments.
chamber in OCTOPLUS 500 - Dr. Eberl MBE-Komponenten GmbH
The OCTOPLUS 500 system was developed for the growth of high quality III-V and II/VI heterostructures on 4 inch or 6 inch Si substrates.
The OCTOPLUS 500 system was developed for the growth of high quality III-V and II/VI heterostructures on 4 inch or 6 inch Si substrates.
chamber in Customized MBE/UHV Systems - Dr. Eberl MBE-Komponenten GmbH
We offer different kinds of custom-tailored, modular and flexible UHV systems, based on proven MBE system design concepts.
We offer different kinds of custom-tailored, modular and flexible UHV systems, based on proven MBE system design concepts.
chamber in Thin Film Systems - Dr. Eberl MBE-Komponenten GmbH
Our versatile thin film deposition system is based on the OCTOPLUS 500 chamber and ideally suited for PVD applications, including CIGS, CdTe and kesterites.
Our versatile thin film deposition system is based on the OCTOPLUS 500 chamber and ideally suited for PVD applications, including CIGS, CdTe and kesterites.
chamber in Organic Deposition System - Dr. Eberl MBE-Komponenten GmbH
We offer different kinds of custom-tailored, modular and flexible UHV systems for organic materials, based on proven MBE system design concepts.
We offer different kinds of custom-tailored, modular and flexible UHV systems for organic materials, based on proven MBE system design concepts.
chamber in OCTOPLUS-O 400 - Dr. Eberl MBE-Komponenten GmbH
The OCTOPLUS-O 400 MBE system features a unique dual zone design with differential pumping that allows depositing oxide layers under high partial pressure.
The OCTOPLUS-O 400 MBE system features a unique dual zone design with differential pumping that allows depositing oxide layers under high partial pressure.
chamber in OCTOPLUS 500 EBV - Dr. Eberl MBE-Komponenten GmbH
The OCTOPLUS 500 EBV system has been developed for the growth of high quality Si/SiGe heterostructures on 4 inch or 6 inch Si substrates.
The OCTOPLUS 500 EBV system has been developed for the growth of high quality Si/SiGe heterostructures on 4 inch or 6 inch Si substrates.
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