wafer in OCTOPLUS 400 - Dr. Eberl MBE-Komponenten GmbH OCTOPLUS 400 systems are ideally suited for III-V, II-VI and other compound semiconductor applications. The OCTOPLUS 400 can be adapted to small wafer segments.
wafer in Thin Film Systems - Dr. Eberl MBE-Komponenten GmbH Our versatile thin film deposition system is based on the OCTOPLUS 500 chamber and ideally suited for PVD applications, including CIGS, CdTe and kesterites.
wafer in Wafer Heater WH - Dr. Eberl MBE-Komponenten GmbH The wafer heaters or heated stations - WH - are suited for all substrate heating applications where the full functionality of a substrate manipulator is not required.
wafer in OCTOPLUS 300 - Dr. Eberl MBE-Komponenten GmbH The OCTOPLUS 300 system is ideally suited for material deposition onto small samples. It ensures a good accessability and easy operation and maintenance.
wafer in OCTOPLUS-O 400 - Dr. Eberl MBE-Komponenten GmbH The OCTOPLUS-O 400 MBE system features a unique dual zone design with differential pumping that allows depositing oxide layers under high partial pressure.
wafer in OCTOPLUS 500 EBV - Dr. Eberl MBE-Komponenten GmbH The OCTOPLUS 500 EBV system has been developed for the growth of high quality Si/SiGe heterostructures on 4 inch or 6 inch Si substrates.